Low Pressure Chemical Vapor Deposition Furnaces – LPCVD

PhotonExport es un Representante Oficial de marcas de equipos de España y Portugal. Contamos con las mejores máquinas, como Low Pressure Chemical Vapor Deposition Furnaces.

CARACTERÍSTICAS DE LPCVD

low plasma enhanced chemical vapor deposition
Low Plasma Enhanced Chemical Vapor Deposition

Diffusion, LPCVD and Oxidation, 1 to 4 quartz independent Tubes, Up to 50 wafers per tube. Ideal for process engineering, Tiny Footprint, Manual or Automatic Loading. Form R&D semiconductor application (TUBESTAR) up to industrial semiconductor automatic furnaces: From 50 to 400 wafers per tube , Up to 300 mm wafer, Best in-class Uniformity, Automatic Loading (DF-SERIES)