PhotonExport a specialist in thin films, semiconductor, and nanotechnology supplies, offers Ion Beam Milling equipment in Spain and Portugal.
Features of Ion Beam Milling
Ion Beam Milling is a process consisting of directing a beam of ions onto at a substrate within a vacuum chamber.
It is based on the momentum exchange between incident ions and atoms of the target material in the collision. This system provides a high vacuum process consisting of a broad beam ion source that irradiates the full substrate area as the substrate rotates.
The incident angle of the beam can be adjusted by a substrate stage tilt. There is substrate cooling during the etch process and uses a vertical substrate surface to avoid contamination.
