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Features of Ion Beam Milling
Ion Beam Milling is a process consisting of a direct beam of ions inciding at a substrate in a vacuum chamber.
It is based on the momentum exchange between incident ions and atoms of the target material in the collision. This system provides a high vacuum process consisting of a broad beam ion source that irradiates the full substrate area as the substrate rotates. The incident angle of the beam can be adjusted by a substrate stage tilt. There is substrate cooling during the etch process and uses a vertical substrate surface to avoid contamination.
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