Photon Export Official Representative in Equipment brans from Spain and Portugal, we have the best machines like: low pressure chemical vapor deposition furnaces. 

FEATURES OF LPCVD

low plasma enhanced chemical vapor deposition
low plasma enhanced chemical vapor deposition

Diffusion, LPCVD and Oxidation, 1 to 4 quartz independent Tubes, Up to 50 wafers per tube. Ideal for process engineering, Tiny Footprint, Manual or Automatic Loading. Form R&D semiconductor application (TUBESTAR) up to industrial semiconductor automatic furnaces: From 50 to 400 wafers per tube , Up to 300 mm
wafer, Best in-class Uniformity, Automatic Loading (DF-SERIES)

IF YOU WANT TO KNOW MORE ABOUT OUR PVD EQUIPMENT, CLICK HERE TO DISCOVER THEM.