Photon Export Official Representative in Equipment brans from Spain and Portugal, we have the best machines like: rie icp etching.

FEATURES OF RIE ICP ETCHING EQUIPMENT

• Process chemistry adaptability : Fluorinated and/or chlorinated chemistries can be mixed in the process without cross contamination.

• Substrate size versatility : Easily switch between 2, 4, 6, or 8-inch substrates.

• Flexibility in substrate handling/loading : Depending on the demands, direct load, preloaded shuttle, or preloaded shuttle with load-lock are possible.

• Low reactor maintenance : it is designed for contamination-free processing with in-situ plasma cleaning results with a low reactor maintenance.

• Software that gives you control : Modules can be used in either continuous wave plasma processing or pulsed plasma processing.

RIE ICP Etching

IF YOU WANT TO KNOW MORE ABOUT OUR PVD EQUIPMENT, CLICK HERE TO DISCOVER THEM.