RIE ICP Etching Equipment

PhotonExport as an official representative of cutting-edge equipment brands in Spain and Portugal, we are thrilled to provide a state-of-the-art RIE ICP Etching Equipment.

Features of RIE ICP Etching Equipment

Process chemistry adaptability

Fluorinated and/or chlorinated chemistries can be mixed in the process without cross contamination.

Substrate size versatility

Our equipment provides unparalleled flexibility when it comes to substrate size. Users can effortlessly transition between 2-inch, 4-inch, 6-inch, or 8-inch substrates, ensuring a wide range of applications and adaptability to diverse projects.

Flexibility in substrate handling and loading

We understand that different projects have distinct demands. To cater to a variety of requirements, our RIE ICP Etching Equipment offers multiple substrate handling and loading options. Whether you prefer direct loading, preloaded shuttles, or preloaded shuttles with load-locks, our equipment can accommodate your specific needs.

Low reactor maintenance

Our RIE ICP Etching Equipment is meticulously designed to ensure contamination-free processing. With in-situ plasma cleaning capabilities, it maintains an impressively low level of reactor maintenance. This means less downtime and more productivity for your operations.

Powerful Control Software

Take command of your processes with our advanced control software. The modules can be tailored to suit either continuous wave plasma processing or pulsed plasma processing, offering unparalleled flexibility and precision.

RIE ICP Etching Equipment

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Contact Us for RIE ICP Etching Equipment

Ready to experience the capabilities of our RIE ICP Etching Equipment firsthand? Request your quote or obtain more information by filling out the form below. Photon Export is your trusted partner for top-notch equipment brands, and we are here to empower your success.