RIE ICP Etching

Photon Export Official Representative in Equipment brans from Spain and Portugal, we have the best machines like: rie icp etching.

FEATURES OF RIE ICP ETCHING EQUIPMENT

• Process chemistry adaptability : Fluorinated and/or chlorinated chemistries can be mixed in the process without cross contamination.

• Substrate size versatility : Easily switch between 2, 4, 6, or 8-inch substrates.

• Flexibility in substrate handling/loading : Depending on the demands, direct load, preloaded shuttle, or preloaded shuttle with load-lock are possible.

• Low reactor maintenance : it is designed for contamination-free processing with in-situ plasma cleaning results with a low reactor maintenance.

• Software that gives you control : Modules can be used in either continuous wave plasma processing or pulsed plasma processing.

RIE ICP Etching

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