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PVD Materials
Sputtering targets
Special optical coating
Hydrophobic coating
Superhydrophobic coating
Optical coating materials
Titanium Oxides
Zirconium Oxides
Aluminium Oxides
Silicon Oxides
Indium Tin Oxides
Tantalum Oxides
Niobium Oxides
Lanthanum Titanate
Magnesium Fluoride
Zinc Sulfide
Zinc Selenide
Chromium
Evaporation materials
Evaporation accessories
Evaporation sources and filament
Quartz crystal monitor
Substrates
Technical glass & substrates
Silicon wafer & crystal
Sapphire wafers
Optics
Lenses
Beam splitter
Mirrors
Optical windows
Optical filters
Prisms
services
Coating service
Bonding services
Sputter target recycling
Chemical analytical services & quality
Equipments
Spin Coater
ALD Equipment
Physical vapor deposition
PVD cluster
Ion beam miling
Glove box
Quartz thin film controller
PVD Sputtering – Physical Vapor Deposition – Magnetron Sputtering
PECVD – Plasma Enhanced Chemical Vapor Deposition
PECVD Small Horizontal Furnace
Low pressure Chemical Vapor Deposition Furnaces – LPCVD
Plasma Enhanced Chemical Vapor Deposition Furnaces
Dry etching
RIE – Reactive Ion Etching
RIE ICP Etching
Diamond cvd growth
RTP – Rapid Thermal Processing
SEM & TEM Microscopy
Bench coater for microscopy sample preparation
Phoenix™ Film Thickness Sensor
Industries
Ophthalmic & precision optic industy
Scientific research
PVD metal hard coating
PVD decorative coating
Semiconductors
Solar EN
Tribological coating
Thin film
TECHNOLOGY
Scientific News & Catalogues
Technical resources
White paper: material chart deposition techniques
Catalogue
Brochure Bonding Specification
Brochure Ramp-Up Consideration
Catalogues Technical Papers
New Catalog Sputtering Targets
Catalog Substrates
ISO9001 Certification
Scientific Trends on Thin Films
Technical Specification: Ceramic/Glass ROBAX
Technical Specification : Fused Silica : Corning 7980
Physical News
Scientific News
Company
Contact Us
Careers/Join us
Vision
World of photonics
PVD – Physical Vapor Deposition
×
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