wafer semiconductor

We offer a wide range of materials and targets specially developed based on the stringent requirements of advanced applications in areas such as High K Dielectric, Microelectromechanical systems (MEMS), Optoelectronics and Integrated Circuit (IC) Interconnects.

Our materials and targets can be used in most thin film vacuum deposition systems (OEM) thanks to our extensive offering of diverse sizes and shapes.

 

MaterialsFormulaPurities
Aluminium OxideAl2O399% to 99.999%
Cerium OxideCeO299.9%
ChromeCr99.8% to 99.95%
CopperCu99.99% to 99.999%
Copper Aluminium SiliciumCu Al Si99.9%
GoldAu99.95% to 99.999%
HafniumHf99.9% to 99.99% (Zr<0.25%)
Hafnium Aluminium OxideHf Al2O399.9%
Hafnium OxideHfO299.95% (Zr<0.25%)
Magnesium Fluoride / ChromeMgF2 Cr99 % to 99.95%
Magnesium OxideMgO99.9%
NickelNi99.6% to 99.995%
NiobiumNb99.95%
Niobium OxideNbO299.95 % to 99.995%
Praseodymium OxidePrO299.9%
SilverAg99.9% to 99.99%
TantalumTa0.99995
TitaniumTi99.8 % to 99.995%
Tungsten Titanium (90:10)W99.9% to 99.99%
YAG (Yttrium Aluminium Garnet Y3Al5O12)Y3Al5O1299.9%
Zirconium OxideZrO299.95% to 99.995%