A |
Aluminio |
Al |
2.7 |
660 |
– |
1.08 |
677 |
821 |
1010 |
Excelente |
“Fabmate®, Intermetálico” |
– |
– |
W |
TiB2-BN, BN |
DC |
“Aleaciones W/Mo/Ta. Evaporación rápida o use un crisol BN.” |
Antimonita de Aluminio |
AlSb |
4.3 |
1080 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Arseniuro de Aluminio |
AlAs |
3.7 |
1600 |
– |
– |
– |
– |
≈1300 |
– |
– |
– |
– |
– |
– |
RF |
– |
Aluminio Bromuro |
AlBr3 |
2.64 |
97 |
– |
– |
– |
– |
≈50 |
– |
– |
Mo |
– |
– |
GR |
– |
Carburo de Aluminio |
Al4C3 |
2.36 |
≈1400 |
D |
– |
– |
– |
≈800 |
Justo |
– |
– |
– |
– |
– |
RF |
– |
Fluoruro de Aluminio |
AlF3 |
2.88 |
1291 |
S |
– |
410 |
490 |
700 |
Pobre |
“Grafito, Fabmate®” |
“Mo, W, Ta” |
– |
– |
Gr |
RF |
– |
Nitruro de Aluminio |
AlN |
3.26 |
>2200 |
S |
**1.00 |
– |
– |
≈1750 |
Justo |
– |
– |
– |
– |
– |
RF-R |
“Se descompone. Evaporación reactiva en N2 con descarga luminosa en 10-3 T.” |
Óxido de Aluminio |
Al2O3 |
3.97 |
2072 |
– |
0.336 |
– |
– |
1550 |
Excelente |
“Fabmate®, Tungsteno” |
W |
– |
W |
– |
RF-R |
“Sapphire excelente en haz de electrones; forma películas suaves y duras.” |
Fosfuro de Aluminio |
AlP |
2.42 |
2 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Aluminio, 1% Cobre |
Al/Cu 99/1 wt% |
2.82 |
640 |
– |
**1.00 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
CC |
“Alimentación de alambre y destello. Difícil desde fuentes duales.” |
Aluminio, 1% Silicio |
“Al/Si 99/1 wt %” |
2.69 |
640 |
– |
**1.00 |
– |
– |
1010 |
– |
– |
– |
|
|
TiB2-BN |
“RF, CC” |
“Alimentación de alambre y destello. Difícil desde fuentes duales.” |
Antimonio |
Sb |
6.68 |
630 |
S |
0.768 |
279 |
345 |
425 |
Pobre |
– |
“Mo*** Ta***” |
“Mo, Ta” |
“Mo, Ta” |
“BN, C, Al2O3” |
“RF, CC” |
Evapora bien. |
Óxido de Antimonio |
Sb2O3 |
5.2 |
656 |
S |
– |
– |
– |
≈300 |
Bueno |
– |
– |
– |
– |
“BN, Al2O3” |
RF-R |
Se descompone sobre W. |
Seleniuro de Antimonio |
Sb2Se3 |
– |
611 |
– |
– |
– |
– |
– |
– |
– |
Ta |
– |
– |
C |
RF |
“Estequiometría variable.” |
Sulfuro de Antimonio |
Sb2S3 |
4.64 |
550 |
– |
– |
– |
– |
≈200 |
Bueno |
“Molibdeno, Tántalo” |
“Mo, Ta” |
– |
“Mo, Ta” |
Al2O3 |
– |
“No hay descomposición.” |
Telururo de Antimonio |
Sb2Te3 |
6.5 |
629 |
– |
**1.00 |
|
|
600 |
– |
– |
– |
– |
– |
C |
RF |
“Se descompone sobre 750°C.” |
Arsénico |
As |
5.73 |
817 |
S |
– |
107 |
150 |
210 |
Pobre |
Fabmate® |
C |
– |
– |
Al2O3 |
– |
“Sublima rápidamente a baja temperatura.” |
Óxido de Arsénico |
As2O3 |
3.74 |
312 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Seleniuro de Arsénico |
As2Se3 |
4.75 |
~360 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
“Al2O3, Q” |
RF |
– |
Sulfuro de Arsénico |
As2S3 |
3.43 |
300 |
– |
– |
– |
– |
≈400 |
Aceptable |
– |
Mo |
– |
– |
“Al2O3, Q” |
RF |
– |
Telururo de Arsénico |
As2Te3 |
6.5 |
362 |
– |
– |
– |
– |
– |
– |
– |
Destello |
– |
– |
– |
– |
“Ver JVST. 1973, 10:748” |
B |
Bario |
Ba |
3.51 |
725 |
– |
2.1 |
545 |
627 |
735 |
Regular |
– |
“W, Ta, Mo” |
W |
W |
Metales |
RF |
“Húmedo sin aleación, reacciona con cerámicas.” |
Cloruro de Bario |
BaCl2 |
3.92 |
963 |
– |
– |
– |
– |
≈650 |
– |
– |
“Ta, Mo” |
– |
– |
– |
RF |
“Precalentar suavemente para desgasificar.” |
Fluoruro de Bario |
BaF2 |
4.89 |
0.355 |
S |
0.793 |
– |
– |
≈700 |
Bueno |
Molibdeno |
Mo |
– |
– |
– |
RF |
– |
Óxido de Bario |
BaO |
5.72 |
1918 |
– |
– |
– |
– |
≈1300 |
Pobre |
– |
– |
– |
– |
Al2O3 |
“RF, RF-R” |
“Se descompone ligeramente.” |
Sulfuro de Bario |
BaS |
4.25 |
1200 |
– |
– |
– |
– |
1.1 |
– |
– |
Mo |
– |
– |
– |
RF |
– |
Titanato de Bario |
BaTiO3 |
6.02 |
1625 |
D |
0.464 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
“Da Ba. Co-evaporación y sputtering OK.” |
Berlilio |
Be |
1.85 |
1278 |
– |
– |
710 |
878 |
1 |
Excelente |
“Grafito, Fabmate®” |
“W, Ta” |
W |
W |
C |
DC |
“Húmedo W/Mo/Ta. Se evapora fácilmente” |
Carburo de Berlilio |
Be2C |
1.9 |
>2100 |
D |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Cloruro de Berlilio |
BeO |
3.01 |
2530 |
– |
– |
– |
– |
1900 |
Bueno |
– |
– |
– |
W |
– |
“RF, RF-R” |
“Sin descomposición por pistolas de electrones.” |
Fluoruro de Berlilio |
BeF2 |
1.99 |
800 |
S |
– |
– |
– |
≈200 |
Bueno |
– |
– |
– |
– |
– |
– |
– |
Óxido de Berlilio |
BeO |
3.01 |
2530 |
– |
– |
– |
– |
1900 |
Bueno |
– |
– |
– |
W |
– |
“RF, RF-R” |
“Sin descomposición por pistolas de electrones.” |
Bismuto |
Bi |
9.8 |
271 |
– |
0.79 |
330 |
410 |
520 |
Excelente |
“Fabmate®, Grafito” |
“W, Mo, Ta” |
W |
W |
Al2O3 |
DC |
“Alta resistividad. Los materiales de bajo punto de fusión no son ideales para sputtering.” |
Fluoruro de Bismuto |
BiF3 |
5.32 |
727 |
S |
– |
– |
– |
≈300 |
– |
– |
– |
– |
– |
Gr |
RF |
– |
Óxido de Bismuto |
Bi2O3 |
8.55 |
860 |
– |
**1.00 |
– |
– |
≈1400 |
Pobre |
– |
– |
– |
– |
– |
“RF, RF-R” |
– |
Seleniuro de Bismuto |
Bi2Se3 |
6.82 |
710 |
D |
**1.00 |
– |
– |
≈650 |
Bueno |
– |
– |
– |
– |
“Gr, Q” |
RF |
“Co-evaporación de 2 fuentes o pulverización.” |
Bisulfuro de Bismuto |
Bi2S3 |
7.39 |
685 |
D |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Telururo de Bismuto |
Bi2Te3 |
7.7 |
573 |
– |
**1.00 |
– |
– |
≈600 |
– |
– |
“W, Mo” |
– |
– |
“Gr, Q” |
RF |
“Co-evaporación de 2 fuentes o pulverización.” |
Titanato de Bismuto |
Bi2Ti2O7 |
– |
870 |
D |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
“Pulverización o co-evaporación de 2 fuentes en O2 a 10-2 Torr.” |
Boro |
B |
2.34 |
2079 |
– |
0.389 |
1.278 |
1.548 |
1797 |
Excelente |
“Fabmate®, Grafito” |
C |
– |
– |
C |
RF |
“Explota con enfriamiento rápido. Forma carburo con el recipiente.” |
Carburo de Boro |
B4C |
2.52 |
2350 |
– |
**1.00 |
2.5 |
2.58 |
2650 |
Excelente |
“Fabmate®, Grafito” |
– |
– |
– |
– |
RF |
“Similar al cromo.” |
Nitruro de Boro |
BN |
2.25 |
3000 |
S |
– |
– |
– |
1600 |
Pobre |
– |
– |
– |
– |
– |
“RF, RF-R” |
“Se descompone cuando se pulveriza. Se prefiere reactivo.” |
Óxido de Boro |
B2O3 |
1.81 |
≈450 |
– |
– |
– |
– |
≈1400 |
Bueno |
Molibdeno |
Mo |
– |
– |
– |
– |
Azufre de Boro |
B2S3 |
1.55 |
310 |
– |
– |
– |
– |
800 |
– |
– |
– |
– |
– |
Gr |
RF |
– |
C |
Cadmio |
Cd |
8.64 |
321 |
– |
0.682 |
64 |
120 |
180 |
Pobre |
– |
“W, Mo, Ta” |
– |
“W, Mo, Ta” |
“Al2O3, Q” |
“DC, RF” |
“Malo para sistemas de vacío. Bajo coeficiente de adherencia.” |
Antimonuro de cadmio |
Cd3Sb2 |
6.92 |
456 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Arseniuro de cadmio |
Cd3As2 |
6.21 |
721 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Q |
RF |
– |
Cadmio bromuro |
CdBr2 |
5.19 |
567 |
– |
– |
– |
– |
≈300 |
– |
– |
– |
– |
– |
– |
– |
Cadmio cloruro |
CdCl2 |
4.05 |
568 |
– |
– |
– |
– |
≈400 |
– |
– |
– |
– |
– |
– |
– |
Cadmio fluoruro |
CdF2 |
6.64 |
1.1 |
– |
– |
– |
– |
≈500 |
– |
– |
– |
– |
– |
– |
RF |
– |
Yoduro de cadmio |
CdI2 |
5.67 |
387 |
– |
– |
– |
– |
≈250 |
– |
– |
– |
– |
– |
– |
– |
Óxido de cadmio |
CdO |
6.95 |
>1500 |
D |
– |
– |
– |
≈530 |
– |
– |
– |
– |
– |
– |
RF-R |
Disproporciona. |
Seleniuro de cadmio |
CdSe |
5.81 |
>1350 |
S |
**1.00 |
– |
– |
540 |
Bueno |
“Molibdeno, Tantalio” |
“Mo, Ta” |
– |
– |
“Al2O3, Q” |
RF |
“Evapora fácilmente.” |
Cadmio sulfuro |
CdS |
4.82 |
1750 |
S |
1.02 |
– |
– |
550 |
Justo |
– |
“W, Mo, Ta” |
– |
W |
“Al2O3, Q” |
RF |
“Coeficiente de adherencia afectado por el sustrato.” |
Telururo de cadmio |
CdTe |
5.85 |
1092 |
– |
0.98 |
– |
– |
450 |
– |
– |
“W, Mo, Ta” |
W |
“W, Ta, Mo” |
– |
RF |
“La estequiometría depende de la temperatura del sustrato. n~2.6.” |
Calcio |
Ca |
1.54 |
839 |
S |
2.62 |
272 |
357 |
459 |
Pobre |
– |
W |
W |
W |
“Al2O3, Q” |
– |
Corroe en el aire. |
Fluoruro de Calcio |
CaF2 |
3.18 |
1423 |
– |
0.775 |
– |
– |
≈1100 |
– |
– |
“W, Mo, Ta” |
“W, Mo, Ta” |
“W, Mo, Ta” |
Q |
RF |
“Control de la tasa importante. Precalentar suavemente para liberar gases.” |
Óxido de Calcio |
CaO |
~3.3 |
2614 |
– |
– |
– |
– |
≈1700 |
– |
– |
“W, Mo” |
– |
– |
ZrO2 |
RF-R |
“Forma óxidos volátiles con W/Mo.” |
Silicato de Calcio |
CaSiO3 |
2.91 |
1540 |
– |
– |
– |
– |
– |
Bueno |
– |
– |
– |
– |
Q |
RF |
– |
Sulfuros de Calcio |
CaS |
2.5 |
2525 |
D |
– |
– |
– |
1100 |
– |
– |
Mo |
– |
– |
– |
RF |
Se descompone. |
Rutilo de Calcio |
CaTiO3 |
4.1 |
1975 |
– |
– |
1490 |
1600 |
1690 |
Pobre |
– |
– |
– |
– |
– |
RF |
“Se desproporciona, excepto en pulverización.” |
Tungstato de Calcio |
CaWO4 |
6.06 |
1200 |
– |
– |
– |
– |
– |
Bueno |
– |
W |
– |
– |
– |
RF |
– |
Carbono |
C |
1.8–2.1 |
≈3652 |
S |
3.26 |
1657 |
1867 |
2137 |
Excelente |
“Fabmate®, Grafito” |
– |
– |
– |
– |
PDC |
“E-beam preferido. Evaporación por arco. Adhesión débil de la película.” |
Cerio |
Ce |
~6.70 |
798 |
– |
**1.00 |
970 |
1150 |
1380 |
Bueno |
– |
“W, Ta” |
W |
“W, Ta” |
Al2O3 |
“DC, RF” |
– |
Óxido de Cerio (III) |
Ce2O3 |
6.86 |
1692 |
– |
– |
– |
– |
– |
Regular |
– |
W |
– |
– |
– |
– |
“Aleaciones con fuente. Usa un barco de W de 0.015”–0.020”.” |
Óxido de Cerio (IV) |
CeO2 |
7.13 |
≈2600 |
– |
**1.00 |
1890 |
2000 |
2310 |
Bueno |
“Tántalo, Grafito, Fabmate®” |
W |
– |
– |
– |
“RF, RF-R” |
“Muy poca descomposición.” |
Fluoruro de Cerio |
CeF3 |
6.16 |
1460 |
– |
**1.00 |
– |
– |
≈900 |
Bueno |
“Tungsteno, Tántalo, Molibdeno” |
“W, Mo, Ta” |
– |
“Mo, Ta” |
– |
RF |
“Precalentar suavemente para liberar gases. n~1.7.” |
Cesio |
Cs |
1.88 |
28 |
– |
– |
-16 |
22 |
80 |
– |
– |
– |
– |
– |
Q |
– |
– |
Bromuro de Cesio |
CsBr |
3.04 |
636 |
– |
– |
– |
– |
≈400 |
– |
– |
W |
– |
– |
– |
RF |
– |
Cloruro de Cesio |
CsCl |
3.99 |
645 |
– |
– |
– |
– |
≈500 |
– |
– |
W |
– |
– |
– |
RF |
– |
Fluoruro de Cesio |
CsF |
4.12 |
682 |
– |
– |
– |
– |
≈500 |
– |
– |
W |
– |
– |
– |
RF |
– |
Hidróxido de Cesio |
CsOH |
3.68 |
272 |
– |
– |
– |
– |
550 |
– |
– |
– |
– |
– |
– |
– |
Yoduro de Cesio |
CsI |
4.51 |
626 |
– |
– |
– |
– |
≈500 |
– |
– |
W |
– |
– |
Q |
RF |
– |
Chiolita |
Na5Al3F14 |
2.9 |
735 |
– |
– |
– |
– |
≈800 |
– |
– |
“Mo, W” |
– |
– |
– |
RF |
|
Cromo |
Cr |
7.2 |
1.857 |
S |
0.305 |
837 |
977 |
1157 |
Bueno |
“Fabmate®, Grafito, Tungsteno” |
“Varillas W plated Cr” |
W |
W |
VitC |
DC |
“Películas muy adherentes. Tasas altas posibles.” |
Boruro de Cromo |
CrB |
6.17 |
1950-2050 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Bromuro de Cromo (II) |
CrBr2 |
4.36 |
842 |
– |
– |
– |
– |
550 |
– |
– |
– |
– |
– |
– |
RF |
– |
Carburo de Cromo |
Cr3C2 |
6.68 |
1895 |
– |
– |
– |
– |
≈2000 |
Regular |
– |
W |
– |
– |
– |
RF |
– |
Cloruro de Cromo |
CrCl2 |
2.88 |
824 |
– |
– |
– |
– |
550 |
– |
– |
Fe |
– |
– |
– |
RF |
– |
Óxido de Cromo |
Cr2O3 |
5.21 |
2266 |
– |
**1.00 |
– |
– |
≈2000 |
Bueno |
– |
“W, Mo” |
– |
W |
– |
“RF, RF-R” |
“Se desproporciona a óxidos más bajos; se reoxida a 600°C en aire.” |
Silicuro de Cromo |
CrSi2 |
5.5 |
1490 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Óxido de Silicio-Cromo |
Cr-SiO |
– |
– |
S |
– |
– |
– |
– |
Bueno |
– |
W |
– |
W |
– |
RF |
Evaporación flash. |
Cobalto † |
Co |
8.9 |
1495 |
– |
0.343 |
850 |
990 |
1200 |
Excelente |
Directo en el hogar |
“W, Nb” |
– |
W |
Al2O3 |
DC |
“Aleaciones con W/Ta/Mo.” |
Bromuro de Cobalto |
CoBr2 |
4.91 |
678 |
D |
– |
– |
– |
400 |
– |
– |
– |
– |
– |
– |
RF |
– |
Cloruro de Cobalto |
CoCl2 |
3.36 |
724 |
D |
– |
– |
– |
472 |
– |
– |
– |
– |
– |
– |
RF |
– |
Óxido de Cobalto |
CoO |
6.45 |
1795 |
– |
0.412 |
– |
– |
– |
– |
– |
– |
– |
– |
“DC-R, RF-R” |
“Se prefiere el pulverizado.” |
Cobre |
Cu |
8.92 |
1083 |
– |
0.437 |
727 |
857 |
1017 |
Excelente |
“Grafito, Molibdeno” |
Mo |
W |
W |
“Al2O3, Mo, Ta” |
DC |
“Pobre adhesión. Utilizar intercalador (Cr). Evapora con cualquier material fuente.” |
Cloruro de Cobre |
CuCl |
4.14 |
430 |
* |
– |
– |
– |
≈600 |
– |
– |
– |
– |
– |
– |
RF |
– |
Óxido de Cobre |
Cu2O |
6 |
1235 |
S |
**1.00 |
– |
– |
≈600 |
Bueno |
“Grafito, Fabmate®, Tantalio” |
Ta |
– |
– |
Al2O3 |
“DC-R, RF-R” |
– |
Sulfuros de Cobre |
Cu2S |
5.6 |
1100 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Criolita |
Na3AlF6 |
2.9 |
1 |
– |
– |
1020 |
1260 |
1480 |
Excelente |
“Fabmate®, Tungsteno” |
“W, Mo, Ta” |
– |
“W, Mo, Ta” |
VitC |
RF |
“Los trozos grandes reducen el salpique. Poca descomposición.” |
D |
Disprosio |
Dy |
8.55 |
1412 |
– |
0.6 |
625 |
750 |
900 |
Bueno |
“Directo en el hogar” |
Ta |
– |
– |
– |
DC |
– |
Fluoruro de Disprosio |
DyF3 |
– |
1360 |
S |
– |
– |
– |
≈800 |
Bueno |
– |
Ta |
– |
– |
– |
RF |
– |
Óxido de Disprosio |
Dy2O3 |
7.81 |
2340 |
– |
– |
– |
– |
≈1400 |
– |
– |
– |
– |
– |
“RF, RF-R” |
Pierde oxígeno |
E |
Erbio |
Er |
9.07 |
1529 |
S |
0.74 |
650 |
775 |
930 |
Bueno |
“Wolframio, Tántalo” |
“W, Ta” |
– |
– |
– |
DC |
– |
Fluoruro de Erbio |
ErF3 |
7.82 |
1350 |
– |
– |
– |
– |
≈750 |
– |
– |
Mo |
– |
– |
– |
RF |
“Ver JVST. 1985; A3(6):2320.” |
Óxido de Erbio |
Er2O3 |
8.64 |
2350 |
– |
**1.00 |
– |
– |
≈1600 |
– |
– |
– |
– |
– |
– |
“RF, RF-R” |
Pierde oxígeno. |
Escandio |
Sc |
2.99 |
1541 |
– |
0.91 |
714 |
837 |
1002 |
Excelente |
“Tungsteno, Molibdeno” |
W |
– |
– |
Al2O3 |
RF |
Se alea con Ta. |
Óxido de Escandio |
Sc2O3 |
3.86 |
2300 |
– |
– |
– |
– |
~400 |
Regular |
– |
– |
– |
– |
– |
“RF, RF-R” |
– |
Europio |
Eu |
5.24 |
822 |
S |
**1.00 |
280 |
360 |
480 |
Aceptable |
– |
“W, Ta” |
– |
– |
Al2O3 |
DC |
“Baja solubilidad de Ta.” |
Fluoruro de Europio |
EuF2 |
6.5 |
1380 |
– |
– |
– |
– |
≈950 |
– |
– |
Mo |
– |
– |
– |
RF |
– |
Óxido de Europio |
Eu2O3 |
7.42 |
2350 |
– |
– |
– |
– |
≈1600 |
Bueno |
– |
“Ta, W” |
– |
– |
ThO2 |
“RF, RF-R” |
“Pierde oxígeno. Películas claras y duras.” |
Sulfuro de Europio |
EuS |
5.75 |
– |
– |
– |
– |
– |
– |
Bueno |
– |
– |
– |
– |
– |
RF |
– |
G |
Gadolinio † |
Gd |
7.9 |
1313 |
– |
0.67 |
760 |
900 |
1175 |
Excelente |
“Directo en el corazón” |
Ta |
– |
– |
Al2O3 |
DC |
“Alta solubilidad de Ta” |
Carburo de gadolinio |
GdC2 |
– |
– |
– |
– |
– |
– |
1500 |
– |
– |
– |
– |
– |
C |
RF |
“Se descompone bajo esputtering.” |
Óxido de gadolinio |
Gd2O3 |
7.41 |
2330 |
– |
– |
– |
– |
– |
Regular |
– |
– |
– |
– |
– |
“RF, RF-R” |
Pierde oxígeno. |
Galio |
Ga |
5.9 |
30 |
– |
– |
619 |
742 |
907 |
Bueno |
Fabmate® |
– |
– |
– |
“Al2O3, Q” |
– |
“Aleaciones con W/Ta/Mo. Usar pistón de electrones. Materiales con punto de fusión bajo no son ideales para esputtering.” |
Antimoniuro de galio |
GaSb |
5.6 |
710 |
– |
– |
– |
– |
– |
Regular |
– |
“W, Ta” |
– |
– |
– |
RF |
Evaporación flash. |
Arseniuro de galio |
GaAs |
5.3 |
1238 |
– |
– |
– |
– |
– |
Bueno |
“Grafito, Fabmate®” |
“W, Ta” |
– |
– |
C |
RF |
Evaporación flash. |
Niobio de galio |
GaN |
6.1 |
800 |
S |
– |
– |
– |
≈200 |
– |
– |
– |
– |
– |
Al2O3 |
“RF, RF-R” |
“Evaporar Ga en 10-3 Torr N2.” |
Óxido de galio |
Ga2O3 |
6.44 |
1900 |
– |
– |
– |
– |
– |
– |
– |
W |
– |
– |
– |
RF |
Pierde oxígeno. |
Fosfuro de galio |
GaP |
4.1 |
1540 |
– |
– |
– |
770 |
920 |
– |
– |
“W, Ta” |
– |
W |
Q |
RF |
“No se descompone. Control de tasa importante.” |
Germanio |
Ge |
5.35 |
937 |
– |
0.516 |
812 |
957 |
1167 |
Excelente |
“Fabmate®, Grafito” |
“W, C, Ta” |
– |
– |
“Q, Al2O3” |
DC |
“Películas excelentes de pistón de electrones.” |
Óxido de germanio (II) |
GeO |
– |
700 |
S |
– |
– |
– |
500 |
– |
– |
– |
– |
– |
Q |
RF |
– |
Óxido de germanio (III) |
GeO2 |
6.24 |
1086 |
– |
– |
– |
– |
≈625 |
Bueno |
“Fabmate®, Tantalum, Molibdeno” |
“Ta, Mo” |
– |
“W, Mo” |
“Q, Al2O3” |
RF-R |
“Similar a SiO; película predominantemente GeO.” |
Nitrato de germanio |
Ge3N2 |
5.2 |
450 |
S |
– |
– |
– |
~650 |
– |
– |
– |
– |
– |
– |
RF-R |
“Preferido para esputtering.” |
Telururo de germanio |
GeTe |
6.2 |
725 |
– |
– |
– |
– |
381 |
– |
– |
“W, Mo” |
– |
W |
“Q, Al2O3” |
RF |
– |
Vidrio, Schott® 8329 |
— |
2.2 |
1.3 |
– |
– |
– |
– |
– |
Excelente |
– |
– |
– |
– |
– |
RF |
“Vidrio alcalino evaporativo. Fundir al aire antes de evaporar.” |
H |
Hafnio |
Hf |
13.31 |
2227 |
– |
0.36 |
2160 |
2250 |
3090 |
Bueno |
– |
– |
– |
– |
– |
DC |
– |
Boruro de Hafnio |
HfB2 |
10.5 |
3250 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
“DC, RF” |
– |
Carburo de Hafnio |
HfC |
12.2 |
≈3890 |
S |
**1.00 |
– |
– |
≈2600 |
– |
– |
– |
– |
– |
– |
RF |
– |
Nitrato de Hafnio |
HfN |
13.8 |
3305 |
– |
**1.00 |
– |
– |
– |
– |
– |
– |
– |
– |
“RF, RF-R” |
– |
Óxido de Hafnio |
HfO2 |
9.68 |
2758 |
– |
**1.00 |
– |
– |
≈2500 |
Regular |
“Directo en el horno” |
– |
– |
– |
– |
“RF, RF-R” |
Pelicula HfO. |
Silicida de Hafnio |
HfSi2 |
7.2 |
1750 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Holmio |
Ho |
8.8 |
1474 |
– |
0.58 |
650 |
770 |
950 |
Bueno |
– |
“W, Ta” |
W |
W |
– |
– |
– |
Hierro † |
Fe |
7.86 |
1535 |
– |
0.349 |
858 |
998 |
1180 |
Excelente |
Fabmate®‡ |
W |
W |
W |
Al2O3 |
DC |
“Ataca a las películas de W de manera fuerte, suave. Precalentar suavemente para desgasificar.” |
Óxido de Hierro (II) |
FeO |
5.7 |
1369 |
– |
– |
– |
– |
– |
Pobre |
– |
– |
– |
– |
– |
“Decompone; preferido en sputtering.” |
Óxido de Hierro (III) |
Fe2O3 |
5.24 |
1565 |
– |
**1.00 |
– |
– |
– |
Bueno |
– |
W |
– |
W |
– |
– |
“Se disocia a Fe3O4 a 1,530°C.” |
Yoduro de Hierro |
FeI2 |
5.32 |
– |
– |
– |
– |
– |
400 |
– |
– |
– |
– |
– |
Fe |
RF |
– |
Sulfuro de Hierro |
FeS |
4.74 |
1193 |
D |
– |
– |
– |
– |
– |
– |
– |
– |
Al2O3 |
RF |
Se descompone |
Fluoruro de Holmio |
HoF3 |
7.68 |
1143 |
– |
– |
– |
– |
≈800 |
– |
– |
– |
– |
– |
Q |
“DC, RF” |
– |
Óxido de Holmio |
Ho2O3 |
8.41 |
2370 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
“RF, RF-R” |
Pierde oxígeno. |
I |
Inconel® |
Ni/Cr/Fe |
8.5 |
1425 |
– |
– |
– |
– |
– |
Bueno |
“Fabmate®, Tungsteno” |
W |
W |
W |
– |
DC |
“Usar alambre fino envuelto en W. Se requiere baja tasa para películas suaves.” |
Indio |
In |
7.3 |
157 |
– |
0.841 |
487 |
597 |
742 |
Excelente |
“Fabmate®, Grafito, Molibdeno” |
“W, Mo” |
– |
W |
“Gr, Al2O3” |
DC |
“Humedecer W y Cu. Usar revestimiento de Mo. Materiales de bajo punto de fusión no son ideales para sputtering.” |
Óxido de Indio (I) |
In2O |
6.99 |
≈600 |
S |
– |
– |
– |
650 |
– |
– |
– |
– |
– |
– |
RF |
“Se descompone bajo sputtering.” |
Óxido de Indio (III) |
In2O3 |
7.18 |
850 |
– |
**1.00 |
– |
– |
≈1200 |
Bueno |
– |
“W, Pt” |
– |
– |
Al2O3 |
– |
– |
Disulfuro de Indio (I) |
In2S |
5.87 |
653 |
– |
– |
– |
– |
650 |
– |
– |
– |
– |
– |
Gr |
RF |
– |
Disulfuro de Indio (II) |
InS |
5.18 |
692 |
S |
– |
– |
– |
650 |
– |
– |
– |
– |
– |
Gr |
RF |
– |
Trisulfuro de Indio (III) |
In2S3 |
4.9 |
1050 |
S |
– |
– |
– |
850 |
– |
– |
– |
– |
– |
Gr |
RF |
Película In2S. |
Telururo de Indio (II) |
InTe |
6.29 |
696 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Telururo de Indio (III) |
In2Te3 |
5.78 |
667 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
“Preferido para sputtering; o co-evaporar desde 2 fuentes; destello.” |
Antimonuro de Indio |
InSb |
5.8 |
535 |
– |
– |
– |
– |
– |
– |
– |
W |
– |
– |
– |
RF |
“Se descompone. Preferido para sputtering; o co-evaporar.” |
Arseniuro de Indio |
InAs |
5.7 |
943 |
– |
– |
780 |
870 |
970 |
– |
– |
W |
– |
– |
– |
RF |
– |
Nitruro de Indio |
InN |
7 |
1200 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Fosfuro de Indio |
InP |
4.8 |
1070 |
– |
– |
– |
630 |
730 |
– |
– |
“W, Ta” |
– |
“W, Ta” |
Gr |
RF |
“Los depósitos son ricos en P.” |
Seleniuro de Indio |
In2Se3 |
5.67 |
890 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
“Preferido en sputtering; o co-evaporar desde 2 fuentes; destello.” |
Óxido de Indio y Estaño |
“In2O3/SnO290/10 wt%” |
– |
1.8 |
S |
– |
– |
– |
– |
– |
“Fabmate®, Grafito” |
– |
– |
– |
– |
– |
Iridio |
Ir |
22.42 |
2410 |
– |
0.129 |
1850 |
2080 |
2380 |
Bueno |
– |
– |
– |
– |
– |
DC |
– |
K |
Kanthal |
FeCrAl |
7.1 |
– |
– |
– |
– |
– |
– |
– |
– |
W |
W |
W |
– |
DC |
– |
L |
Lanthanum |
La |
6.15 |
921 |
– |
0.92 |
990 |
1212 |
1388 |
Excelente |
“Wolframio, Tantalio” |
“W, Ta” |
– |
– |
Al2O3 |
RF |
“Las películas se quemarán en el aire si se raspan.” |
Lanthanum Boride |
LaB6 |
2.61 |
2210 |
D |
**1.00 |
– |
– |
– |
Bueno |
– |
– |
– |
– |
– |
RF |
– |
Lanthanum Bromide |
LaBr3 |
5.06 |
783 |
– |
– |
– |
– |
– |
– |
– |
– |
Ta |
– |
RF |
Higroscópico. |
Fluoruro de Lanthanum |
LaF3 |
~6.0 |
1490 |
S |
– |
– |
– |
900 |
Bueno |
“Tantalio, Molibdeno” |
“Ta, Mo” |
– |
Ta |
– |
RF |
“Sin descomposición. n~1.6.” |
Óxido de Lanthanum |
La2O3 |
6.51 |
2307 |
– |
**1.00 |
– |
– |
1400 |
Bueno |
“Grafito, Fabmate®, Wolframio” |
“W, Ta” |
– |
– |
– |
RF |
“Pierde oxígeno. n~1.73.” |
Litio |
Li |
0.53 |
181 |
– |
5.9 |
227 |
307 |
407 |
Bueno |
Tantalio |
Ta |
– |
– |
Al2O3 |
– |
“El metal reacciona rápidamente con el aire.” |
Bromuro de litio |
LiBr |
3.46 |
550 |
– |
– |
– |
– |
≈500 |
– |
– |
Ni |
– |
– |
– |
RF |
– |
Cloruro de litio |
LiCl |
2.07 |
605 |
– |
– |
– |
– |
400 |
– |
– |
Ni |
– |
– |
– |
RF |
“Precalentar suavemente para desgasificar.” |
Fluoruro de litio |
LiF |
2.64 |
845 |
– |
0.778 |
875 |
1020 |
1180 |
Bueno |
“Tantalio, Tungsteno, Molibdeno” |
“Ni, Ta, Mo, W” |
– |
– |
Al2O3 |
RF |
“El control de la tasa es importante para películas ópticas. Precalentar suavemente para desgasificar.” |
Yoduro de litio |
LiI |
4.08 |
449 |
– |
– |
– |
– |
400 |
– |
– |
“Mo, W” |
– |
– |
– |
RF |
– |
Litio Niobato |
LiNbO3 |
– |
– |
– |
0.463 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Óxido de Litio |
Li2O |
2.01 |
>1700 |
– |
– |
– |
– |
850 |
– |
– |
– |
– |
– |
– |
RF |
– |
Lutecio |
Lu |
9.84 |
1663 |
– |
– |
– |
– |
1300 |
Excelente |
“Directo en el horno” |
Ta |
– |
– |
Al2O3 |
“RF, DC” |
– |
Óxido de Lutecio |
Lu2O3 |
9.42 |
– |
– |
– |
– |
– |
1400 |
– |
– |
– |
– |
– |
– |
RF |
Se descompone. |
M |
Magnesio |
Mg |
1.74 |
649 |
S |
1.61 |
185 |
247 |
327 |
Bueno |
“Fabmate®, Grafito, Tungsteno” |
“W, Mo, Ta, Cb” |
W |
W |
Al2O3 |
DC |
“Posibles tasas extremadamente altas.” |
Aluminato de Magnesio |
MgAl2O4 |
3.6 |
2135 |
– |
– |
– |
– |
– |
Bueno |
– |
– |
– |
– |
– |
RF |
Espinela natural. |
Bromuro de Magnesio |
MgBr2 |
3.72 |
700 |
– |
– |
– |
– |
≈450 |
– |
– |
Ni |
– |
– |
– |
RF |
Se descompone. |
Cloruro de Magnesio |
MgCl2 |
2.32 |
714 |
– |
– |
– |
– |
400 |
– |
– |
Ni |
– |
– |
– |
RF |
Se descompone. |
Fluoruro de Magnesio |
MgF2 |
2.9–3.2 |
1261 |
– |
0.637 |
– |
– |
1 |
Excelente |
“Fabmate®, Grafito, Molibdeno” |
“Mo, Ta” |
– |
– |
Al2O3 |
RF |
“Control importante de la temperatura del sustrato y la tasa. Reacciona con W. Mo está bien.” |
Yoduro de Magnesio |
MgI2 |
4.43 |
<637 |
D |
– |
– |
– |
200 |
– |
– |
– |
– |
– |
– |
RF |
– |
Óxido de Magnesio |
MgO |
3.58 |
2852 |
– |
0.411 |
– |
– |
1300 |
Bueno |
“Fabmate®, Grafito” |
– |
– |
– |
“C, Al2O3” |
“RF, RF-R” |
“Se evapora a 10-3Torr O2 para la estequiometría.” |
Manganeso |
Mn |
7.2 |
1244 |
S |
0.377 |
507 |
572 |
647 |
Bueno |
Tungsteno |
“W, Ta, Mo” |
W |
W |
Al2O3 |
DC |
– |
Óxido de Manganeso (II) |
MnO |
5.37 |
1945 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Óxido de Manganeso (III) |
Mn2O3 |
4.5 |
1080 |
– |
0.467 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Óxido de Manganeso (IV) |
MnO2 |
5.03 |
535 |
– |
– |
– |
– |
– |
Pobre |
– |
W |
– |
W |
– |
RF-R |
“Pierde oxígeno a 535°C.” |
Bromuro de manganeso |
MnBr2 |
4.39 |
– |
D |
– |
– |
– |
500 |
– |
– |
– |
– |
– |
– |
RF |
– |
Cloruro de manganeso |
MnCl2 |
2.98 |
650 |
– |
– |
-68 |
-42 |
-6 |
– |
– |
– |
– |
– |
– |
RF |
– |
Sulfuro de manganeso |
MnS |
3.99 |
– |
D |
– |
– |
– |
1300 |
– |
– |
Mo |
– |
– |
– |
RF |
Se descompone. |
Mercurio |
Hg |
13.55 |
≈39 |
– |
– |
-68 |
-42 |
-6 |
– |
– |
– |
– |
– |
– |
– |
Sulfuro de mercurio |
HgS |
8.1 |
584 |
S |
– |
– |
– |
250 |
– |
– |
– |
– |
– |
Al2O3 |
RF |
Se descompone. |
Molibdeno |
Mo |
10.2 |
2617 |
– |
0.257 |
1592 |
1822 |
2117 |
Excelente |
“Fabmate®, Grafito” |
– |
– |
– |
– |
DC |
“Películas lisas, duras. Se requiere desgasificación cuidadosa.” |
Boruro de molibdeno |
MoB2 |
7.12 |
2100 |
– |
– |
– |
– |
– |
Pobre |
– |
– |
– |
– |
– |
RF |
– |
Carburo de molibdeno |
Mo2C |
8.9 |
2687 |
– |
**1.00 |
– |
– |
– |
Aceptable |
– |
– |
– |
– |
– |
RF |
“La evaporación de Mo(CO)6 produce Mo2C.” |
Sulfuro de molibdeno |
MoS2 |
4.8 |
1185 |
– |
**1.00 |
– |
– |
≈50 |
– |
– |
– |
– |
– |
– |
RF |
– |
Óxido de molibdeno |
MoO3 |
4.69 |
795 |
S |
**1.00 |
– |
– |
≈900 |
– |
– |
Mo |
– |
Mo |
“Al2O3, BN” |
RF |
“Pérdida ligera de oxígeno.” |
Silicuro de molibdeno |
MoSi2 |
6.31 |
2050 |
– |
**1.00 |
– |
– |
– |
– |
– |
W |
– |
– |
– |
RF |
Se descompone. |
N |
Neodimio |
Nd |
7.01 |
1021 |
– |
**1.00 |
731 |
871 |
1062 |
Excelente |
Tántalo |
Ta |
– |
– |
Al2O3 |
DC |
“Baja solubilidad en W.” |
Fluoruro de Neodimio |
NdF3 |
6.5 |
1410 |
– |
– |
– |
– |
≈900 |
Bueno |
“Wolframio, Molibdeno” |
“Mo, W” |
– |
“Mo, Ta” |
Al2O3 |
RF |
“Muy poca descomposición.” |
Óxido de Neodimio |
Nd2O3 |
7.24 |
≈1900 |
– |
– |
– |
– |
≈1400 |
Bueno |
“Tántalo, Wolframio” |
“Ta, W” |
– |
– |
ThO2 |
“RF, RF-R” |
“Pierde oxígeno; las películas son claras. Se prefiere el haz electrónico.” |
NiCr® IV † |
Ni/Cr |
8.5 |
1395 |
– |
**1.00 |
847 |
987 |
1217 |
Excelente |
Fabmate® |
Mo***, W***, Ta*** |
W |
W, Ta |
Al2O3 |
DC |
“Aleaciones con W/Ta/Mo.” |
Níquel † |
Ni |
8.9 |
1453 |
– |
0.331 |
927 |
1072 |
1262 |
Excelente |
Fabmate®‡ |
W*** |
– |
– |
Al2O3 |
DC |
“Aleaciones con W/Ta/Mo. Películas adherentes lisas.” |
Bromuro de Níquel |
NiBr2 |
5.1 |
963 |
S |
– |
– |
– |
362 |
– |
– |
– |
– |
– |
RF |
– |
Cloruro de Níquel |
NiCl2 |
3.55 |
1001 |
S |
– |
– |
– |
444 |
– |
– |
– |
– |
– |
RF |
– |
Óxido de Níquel |
NiO |
6.67 |
1984 |
– |
**1.00 |
– |
– |
≈1470 |
– |
– |
– |
– |
– |
Al2O3 |
RF-R |
“Se disocia al calentarse.” |
Niquel/Hierro † |
Ni/Fe |
– |
– |
– |
**1.00 |
– |
– |
– |
– |
Fabmate®‡ |
– |
– |
– |
– |
– |
– |
Nimendium † |
Ni3%Mn |
8.8 |
1425 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
DC |
– |
Niobio |
Nb |
8.57 |
2468 |
– |
0.492 |
1728 |
1977 |
2287 |
Excelente |
Fabmate® |
– |
– |
– |
– |
DC |
“Ataca W fuente.” |
Óxido de Niobio (II) |
NbO |
7.3 |
– |
– |
– |
– |
– |
1100 |
– |
– |
– |
– |
– |
– |
RF |
– |
Óxido de Niobio (III) |
Nb2O3 |
7.5 |
1780 |
– |
– |
– |
– |
– |
– |
– |
W |
– |
W |
– |
“RF, RF-R” |
– |
Óxido de Niobio (V) |
Nb2O5 |
4.47 |
1485 |
– |
**1.00 |
– |
– |
– |
– |
– |
W |
– |
W |
– |
“RF, RF-R” |
– |
Boruro de Niobio |
NbB2 |
6.97 |
2900 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Carburo de Niobio |
NbC |
7.6 |
3500 |
– |
**1.00 |
– |
– |
– |
Justo |
– |
– |
– |
– |
– |
RF |
– |
Nitrato de Niobio |
NbN |
8.4 |
2573 |
– |
**1.00 |
– |
– |
– |
– |
– |
– |
– |
– |
“RF, RF-R” |
“Reacciona. Se evapora Nb en 10-3 Torr N2.” |
Telururo de Niobio |
NbTe2 |
7.6 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
“Composición variable.” |
Niobio-Estaño |
Nb3Sn |
– |
– |
– |
– |
– |
– |
– |
Excelente |
– |
– |
– |
– |
– |
DC |
“Co-evaporar desde 2 fuentes.” |
O |
Osmio |
Os |
22.48 |
3045 |
– |
– |
2170 |
2430 |
2760 |
Justo |
– |
– |
– |
– |
– |
DC |
– |
Oro |
Au |
19.32 |
1064 |
– |
0.381 |
807 |
947 |
1132 |
Excelente |
“Fabmate®, Tungsteno” |
“W*** Mo***” |
– |
– |
“Al2O3, BN” |
DC |
“Las películas son blandas; no muy adherentes.” |
Óxido de Osmio |
Os2O3 |
– |
– |
D |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
“Deposita Os en 10-3Torr O2.” |
P |
Paladio |
Pd |
12.02 |
1554 |
S |
0.357 |
842 |
992 |
1192 |
Excelente |
“Fabmate®, Grafito, Tungsteno” |
W*** |
W |
W |
Al2O3 |
DC |
“Aleaciones con metales refractarios.” |
Óxido de paladio |
PdO |
9.7 |
870 |
– |
– |
– |
– |
575 |
– |
– |
– |
– |
– |
Al2O3 |
RF-R |
Se descompone. |
Plata |
Ag |
10.5 |
962 |
– |
0.529 |
847 |
958 |
1105 |
Excelente |
“Fabmate®, Tungsteno, Molibdeno, Tantalio” |
W |
Mo |
“Ta, Mo” |
“Al2O3, W” |
DC |
– |
Bromuro de Plata |
AgBr |
6.47 |
432 |
D |
– |
– |
– |
≈380 |
– |
– |
Ta |
– |
– |
Q |
RF |
– |
Cloruro de Plata |
AgCl |
5.56 |
455 |
– |
– |
– |
– |
≈520 |
– |
– |
Mo |
– |
Mo |
Q |
RF |
– |
Yoduro de Plata |
AgI |
6.01 |
558 |
– |
– |
– |
– |
≈500 |
– |
– |
Ta |
– |
– |
– |
RF |
– |
Parylene |
C8H8 |
1.1 |
300–400 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Plástico vapor-depositable. |
Plomo |
Pb |
11.34 |
328 |
– |
1.13 |
342 |
427 |
497 |
Excelente |
Fabmate® |
“W, Mo” |
W |
“W, Ta” |
“Al2O3, Q” |
DC |
– |
Bromuro de plomo |
PbBr2 |
6.66 |
373 |
– |
– |
– |
– |
≈300 |
– |
– |
– |
– |
– |
– |
– |
– |
Cloruro de plomo |
PbCl2 |
5.85 |
501 |
– |
– |
– |
– |
≈325 |
– |
– |
– |
– |
– |
Al2O3 |
RF |
“Descomposición ligera.” |
Fluoruro de plomo |
PbF2 |
8.24 |
855 |
S |
– |
– |
– |
≈400 |
– |
– |
“W, Mo” |
– |
– |
BeO |
RF |
– |
Yoduro de plomo |
PbI2 |
6.16 |
402 |
– |
– |
– |
– |
≈500 |
– |
– |
– |
– |
– |
Q |
– |
– |
Óxido de plomo |
PbO |
9.53 |
886 |
– |
– |
– |
– |
≈550 |
– |
– |
– |
– |
– |
“Q, Al2O3” |
RF-R |
“No hay descomposición. n~2.6.” |
Seleniuro de plomo |
PbSe |
8.1 |
1065 |
S |
– |
– |
– |
≈500 |
– |
– |
“W, Mo” |
– |
W |
“Gr, Al2O3” |
RF |
– |
Estanato de plomo |
PbSnO3 |
8.1 |
1115 |
– |
– |
670 |
780 |
905 |
Malo |
– |
– |
– |
– |
Al2O3 |
RF |
Disproporciona. |
Sulfuro de plomo |
PbS |
7.5 |
1114 |
S |
– |
– |
– |
500 |
– |
– |
W |
– |
“W, Mo” |
“Q, Al2O3” |
RF |
“Descomposición ligera.” |
Telururo de plomo |
PbTe |
8.16 |
917 |
– |
0.651 |
780 |
910 |
1050 |
– |
– |
“Mo, Pt, Ta” |
– |
– |
“Al2O3, Gr” |
RF |
“Los depósitos son ricos en Ta. Se prefiere el pulverizado.” |
Titanato de plomo |
PbTiO3 |
7.52 |
– |
– |
1.16 |
– |
– |
– |
– |
– |
Ta |
– |
– |
– |
RF |
– |
Permalloy® † |
Ni/Fe/Mo/Mn |
8.7 |
1395 |
– |
**1.00 |
947 |
1047 |
1307 |
Bueno |
Fabmate®‡ |
W |
– |
– |
Al2O3 |
DC |
Pelicula baja en Ni. |
Fósforo |
P |
1.82 |
44.1 |
– |
– |
327 |
361 |
402 |
– |
– |
– |
– |
– |
Al2O3 |
– |
El material reacciona violentamente en el aire. |
Nitruro de Fósforo |
P3N5 |
2.51 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF, RF-R |
– |
Platino |
Pt |
21.45 |
1772 |
|
0.245 |
1292 |
1492 |
1747 |
Excelente |
Fabmate®, Grafito |
W |
W |
W |
C |
DC |
Aleaciones con metales. Las películas son suaves, mala adhesión. |
Óxido de Platino |
PtO2 |
10.2 |
450 |
– |
– |
-7 |
– |
– |
– |
– |
– |
– |
– |
RF-R |
Preferible evaporación con haz electrónico. |
Plutonio |
Pu |
19.84 |
641 |
– |
– |
– |
– |
– |
– |
– |
W |
– |
– |
– |
– |
Polonio |
Po |
9.4 |
254 |
– |
– |
117 |
170 |
244 |
– |
– |
– |
– |
– |
Q |
– |
Potasio |
K |
0.86 |
63 |
– |
– |
23 |
60 |
125 |
– |
– |
Mo |
– |
– |
Q |
El metal reacciona rápidamente en el aire. Precalentar suavemente para desgasificar. |
Bromuro de Potasio |
KBr |
2.75 |
734 |
– |
– |
– |
– |
≈450 |
– |
– |
Ta, Mo |
– |
– |
Q |
RF |
Precalentar suavemente para desgasificar. |
Cloruro de Potasio |
KCl |
1.98 |
770 |
S |
– |
– |
– |
510 |
Bueno |
Tantalio |
Ta, Ni |
– |
– |
– |
RF |
Precalentar suavemente para desgasificar. |
Fluoruro de Potasio |
KF |
2.48 |
858 |
– |
– |
– |
– |
≈500 |
– |
– |
– |
– |
– |
Q |
RF |
Precalentar suavemente para desgasificar. |
Hidróxido de Potasio |
KOH |
2.04 |
360 |
– |
– |
– |
– |
≈400 |
– |
– |
– |
– |
– |
– |
Precalentar suavemente para desgasificar. |
Yoduro de Potasio |
KI |
3.13 |
681 |
– |
– |
– |
– |
≈500 |
– |
– |
Ta |
– |
– |
– |
RF |
Precalentar suavemente para desgasificar. |
Praseodimio |
Pr |
6.77 |
931 |
– |
**1.00 |
800 |
950 |
1150 |
Bueno |
– |
Ta |
– |
– |
– |
DC |
– |
Óxido de Praseodimio |
Pr2O3 |
7.07 |
– |
D |
– |
– |
– |
1400 |
Bueno |
– |
– |
– |
– |
ThO2 |
“RF, RF-R” |
Perdió oxígeno. |
PTFE |
PTFE |
2.9 |
330 |
– |
– |
– |
– |
– |
– |
– |
W |
– |
– |
– |
RF |
“Fuente con bafle. Estructura de película dudosa.” |
R |
Radio |
Ra |
“5 (?)” |
700 |
– |
– |
246 |
320 |
416 |
– |
– |
– |
– |
– |
– |
– |
Renio |
Re |
20.53 |
3180 |
– |
0.15 |
1928 |
2207 |
2571 |
Pobre |
– |
– |
– |
– |
– |
DC |
– |
Óxido de Renio |
ReO3 |
~7 |
– |
D |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
“Evaporar Re en 10-3 Torr O2.” |
Rhodio |
Rh |
12.4 |
1966 |
– |
0.21 |
1277 |
1472 |
1707 |
Bueno |
“Fabmate®, Tungsteno” |
W |
W |
W |
“ThO2, VitC” |
DC |
“Se prefiere la pistola de haz de electrones.” |
Rubidio |
Rb |
1.48 |
39 |
– |
– |
-3 |
37 |
111 |
– |
– |
– |
– |
– |
Q |
– |
Cloruro de Rubidio |
RbCl |
2.09 |
718 |
– |
– |
– |
– |
≈550 |
– |
– |
– |
– |
Q |
RF |
– |
Yoduro de Rubidio |
RbI |
3.55 |
647 |
– |
– |
– |
– |
≈400 |
– |
– |
– |
– |
– |
Q |
RF |
– |
Rutenio |
Ru |
12.3 |
2310 |
– |
0.182 |
1780 |
1990 |
2260 |
Pobre |
– |
– |
– |
– |
– |
DC |
– |
S |
Samario |
Sm |
7.52 |
1074 |
– |
0.89 |
373 |
460 |
573 |
Bueno |
– |
Ta |
– |
– |
Al2O3 |
DC |
— |
Óxido de Samario |
Sm2O3 |
8.35 |
2350 |
– |
– |
– |
– |
– |
Bueno |
– |
– |
– |
– |
ThO2 |
“RF, RF-R” |
“Pierde oxígeno. Las películas son lisas y claras.” |
Sulfuros de Samario |
Sm2S3 |
5.73 |
1900 |
– |
– |
– |
– |
– |
Bueno |
– |
– |
– |
– |
– |
– |
Sodio |
Na |
0.97 |
98 |
– |
– |
74 |
124 |
192 |
– |
– |
Ta |
– |
– |
Q |
– |
“Precalentar suavemente para eliminar gases. El metal reacciona rápidamente en el aire.” |
Bromuro de Sodio |
NaBr |
3.2 |
747 |
– |
– |
– |
– |
≈400 |
– |
– |
– |
– |
– |
Q |
RF |
“Precalentar suavemente para eliminar gases.” |
Cloruro de Sodio |
NaCl |
2.17 |
801 |
– |
– |
– |
– |
530 |
Bueno |
– |
“Ta, W, Mo” |
– |
– |
Q |
RF |
“Horno de cobre; poca descomposición. Precalentar suavemente para eliminar gases.” |
Cianuro de Sodio |
NaCN |
– |
564 |
– |
– |
– |
– |
≈550 |
– |
– |
– |
– |
– |
– |
RF |
“Precalentar suavemente para eliminar gases.” |
Fluoruro de Sodio |
NaF |
2.56 |
993 |
– |
– |
– |
– |
≈1000 |
Bueno |
“Tungsteno, Fabmate®” |
“Mo, Ta, W” |
– |
– |
BeO |
RF |
“Precalentar suavemente para eliminar gases. No hay descomposición.” |
Hidróxido de Sodio |
NaOH |
2.13 |
318 |
– |
– |
– |
– |
≈470 |
– |
– |
– |
– |
– |
– |
“Precalentar suavemente para eliminar gases.” |
Selencio |
Se |
4.81 |
217 |
– |
0.864 |
89 |
125 |
170 |
Bueno |
“Fabmate®, Tungsteno, Molibdeno” |
“W, Mo” |
“W, Mo” |
“W, Mo” |
Al2O3 |
– |
“Malo para sistemas de vacío. Alta presión de vapor. Materiales de bajo punto de fusión no ideales para sputtering.” |
Silicio |
Si |
2.32 |
1410 |
– |
0.712 |
992 |
1147 |
1337 |
Regular |
“Fabmate®‡, Tantalio” |
– |
– |
– |
– |
RF |
“Aleaciones con W; usar barco de W pesado. Se produce SiO.” |
Óxido de Silicio (II) |
SiO |
2.13 |
>1702 |
S |
0.87 |
– |
– |
850 |
Regular |
“Fabmate®, Tungsteno, Tantalio” |
Ta |
W |
W |
Ta |
“RF, RF-R” |
“Para evaporación por resistencia, usar caja de bafle y tasa baja.” |
Óxido de Silicio (IV) |
SiO2 |
~2.65 |
1610 |
– |
**1.00 |
* |
* |
1025* |
Excelente |
“Fabmate®, Grafito, Tantalio” |
– |
– |
– |
Al2O3 |
RF |
“Cuarzo excelente en E-beam.” |
Silicio (Tipo N) |
“Si (Tipo N)” |
2.32 |
1410 |
– |
0.712 |
992 |
1147 |
1337 |
Regular |
“Fabmate®‡, Tantalio” |
– |
– |
– |
– |
“DC, RF” |
– |
Silicio (Tipo P) |
“Si (Tipo P)” |
2.32 |
1410 |
– |
0.712 |
992 |
1147 |
1337 |
Regular |
“Fabmate®‡, Tantalio” |
– |
– |
– |
– |
“DC, RF” |
– |
Carburo de Silicio |
SiC |
3.22 |
≈2700 |
“S, D” |
**1.00 |
– |
– |
1 |
– |
– |
– |
– |
– |
RF |
“Preferido para sputtering.” |
Nitruro de Silicio |
Si3N4 |
3.44 |
1900 |
– |
**1.00 |
– |
– |
≈800 |
– |
– |
– |
– |
– |
“RF, RF-R” |
– |
Seleniuro de Silicio |
SiSe |
– |
– |
– |
– |
– |
– |
550 |
– |
– |
– |
– |
– |
Q |
RF |
– |
Disulfuro de Silicio |
SiS |
1.85 |
940 |
S |
– |
– |
– |
450 |
– |
– |
– |
– |
– |
Q |
RF |
– |
Telururo de Silicio |
SiTe2 |
4.39 |
– |
– |
– |
– |
– |
550 |
– |
– |
– |
– |
Q |
RF |
– |
Espinel |
MgAI2O4 |
8 |
– |
– |
– |
– |
– |
– |
Bueno |
– |
– |
– |
– |
– |
RF |
– |
Estroncio |
Sr |
2.6 |
769 |
– |
**1.00 |
239 |
309 |
403 |
Pobre |
– |
“W, Ta, Mo” |
W |
W |
VitC |
RF |
“Se moja pero no se alea con W/Ta/Mo. Puede reaccionar en el aire.” |
Cloruro de Estroncio |
SrCl2 |
3.05 |
875 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Fluoruro de estroncio |
SrF2 |
4.24 |
1473 |
– |
– |
– |
– |
≈1000 |
– |
– |
– |
– |
– |
Al2O3 |
RF |
– |
Óxido de estroncio |
SrO |
4.7 |
2430 |
S |
– |
– |
– |
1500 |
– |
– |
Mo |
– |
– |
Al2O3 |
RF |
“Reacciona con W/Mo.” |
Sulfuros de estroncio |
SrS |
3.7 |
>2000 |
– |
– |
– |
– |
– |
– |
– |
Mo |
– |
– |
– |
RF |
Se descompone. |
Titanato de estroncio |
SrTiO3 |
– |
– |
– |
0.31 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Azufre |
S |
2.07 |
113 |
– |
– |
13 |
19 |
57 |
Pobre |
– |
W |
– |
W |
Q |
– |
“Malo para sistemas de vacío.” |
Supermalloy® † |
Ni/Fe/Mo |
8.9 |
1410 |
– |
– |
– |
– |
– |
Bueno |
Fabmate®‡, |
– |
– |
– |
– |
DC |
“Preferido para sputtering; o co-evaporar desde 2 fuentes: Ni/Fe y Mo.” |
T |
Tantalio |
Ta |
16.6 |
2996 |
– |
0.262 |
1960 |
2240 |
2590 |
Excelente |
“Fabmate®, Grafito” |
– |
– |
– |
– |
DC |
“Forma buenas películas.” |
Boruro de tantalio |
TaB2 |
11.15 |
>3000 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Carburo de tantalio |
TaC |
13.9 |
3880 |
– |
**1.00 |
– |
– |
≈2500 |
– |
– |
– |
– |
– |
– |
RF |
– |
Nitrato de tantalio |
TaN |
16.3 |
3360 |
– |
**1.00 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
“RF, RF-R” |
“Evaporar Ta en 10-3 Torr de N2.” |
Pentóxido de tantalio |
Ta2O5 |
8.2 |
1872 |
– |
0.3 |
1550 |
1780 |
1920 |
Bueno |
“Fabmate®, Tantalio” |
Ta |
W |
W |
VitC |
“RF, RF-R” |
“Leve descomposición. Evaporar Ta en 10-3 Torr de O2.” |
Sulfuros de tantalio |
TaS2 |
– |
>1300 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Tecnecio |
Tc |
11.5 |
2200 |
– |
– |
1570 |
1800 |
2090 |
– |
– |
– |
– |
– |
– |
– |
– |
Telurio |
Te |
6.25 |
449 |
– |
0.9 |
157 |
207 |
277 |
Pobre |
Fabmate® |
“W, Ta” |
W |
“W, Ta” |
“Al2O3, Q” |
RF |
“Mojado sin aleación.” |
Terbio |
Tb |
8.23 |
1356 |
– |
0.66 |
800 |
950 |
1150 |
Excelente |
“Grafito, Fabmate®, Tántalo” |
Ta |
– |
– |
Al2O3 |
RF |
– |
Fluoruro de Terbio |
TbF3 |
– |
1172 |
– |
– |
– |
– |
≈800 |
– |
– |
– |
– |
– |
RF |
– |
Óxido de Terbio |
Tb2O3 |
7.87 |
2387 |
– |
– |
– |
– |
1300 |
– |
– |
– |
– |
– |
RF |
“Se descompone parcialmente.” |
Peróxido de Terbio |
Tb4O7 |
– |
– |
D |
– |
– |
– |
– |
– |
– |
Ta |
– |
– |
– |
RF |
Películas de TbO. |
Talio |
Tl |
11.85 |
304 |
– |
– |
280 |
360 |
470 |
Pobre |
Fabmate® |
“W, Ta” |
– |
W |
“Al2O3, Q” |
DC |
Se moja fácilmente. |
Bromuro de Talio |
TlBr |
7.56 |
480 |
S |
– |
– |
– |
≈250 |
– |
– |
Ta |
– |
– |
Q |
RF |
– |
Cloruro de Talio |
TlCl |
7 |
430 |
S |
– |
– |
– |
≈150 |
– |
– |
Ta |
– |
– |
Q |
RF |
– |
Yoduro de Talio |
TlI |
7.1 |
440 |
S |
– |
– |
– |
≈250 |
– |
– |
– |
– |
– |
Q |
RF |
– |
Óxido de Talio |
Tl2O2 |
10.19 |
717 |
– |
– |
– |
– |
350 |
<- |
– |
– |
– |
– |
RF |
“Se desproporciona a 850°C a Tl2O.” |
Torio |
Th |
11.7 |
1.75 |
– |
– |
1430 |
1660 |
1925 |
Excelente |
“Molibdeno, Tántalo, Wolframio” |
“W, Ta, Mo” |
W |
W |
– |
– |
– |
Bromuro de Torio |
ThBr4 |
5.67 |
610 |
S |
– |
– |
– |
– |
– |
– |
Mo |
– |
– |
– |
– |
Carburo de Torio |
ThC2 |
8.96 |
2655 |
– |
– |
– |
– |
≈2300 |
– |
– |
– |
– |
– |
C |
RF |
– |
Fluoruro de Torio |
ThF4 |
6.32 |
>900 |
– |
– |
– |
– |
≈750 |
Regular |
– |
Mo |
– |
W |
VitC |
RF |
– |
Óxido de Torio |
ThO2 |
9.86 |
3220 |
– |
– |
– |
– |
≈2100 |
Bueno |
Wolframio |
– |
– |
– |
– |
“RF, RF-R” |
– |
Oxyfluoruro de Torio |
ThOF2 |
9.1 |
900 |
– |
– |
– |
– |
– |
– |
– |
“Mo, Ta” |
– |
– |
– |
– |
Sulfuros de Torio |
ThS2 |
7.3 |
1925 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
“Preferido para sputtering; o co-evaporar desde 2 fuentes.” |
Tulio |
Tm |
9.32 |
1545 |
S |
– |
461 |
554 |
680 |
Bueno |
– |
Ta |
– |
– |
Al2O3 |
DC |
– |
Óxido de Tulio |
Tm2O3 |
8.9 |
– |
– |
– |
– |
– |
1500 |
– |
– |
– |
– |
– |
– |
RF |
Se descompone. |
Estaño |
Sn |
7.28 |
232 |
– |
0.724 |
682 |
807 |
997 |
Excelente |
“Fabmate®, Tántalo” |
Mo |
W |
W |
Al2O3 |
DC |
“Humedecer Mo con baja potencia de sputtering. Usar liner de Ta en pistolas E-beam. Los materiales de bajo punto de fusión no son ideales para sputtering.” |
Óxido de Estaño |
SnO2 |
6.95 |
1630 |
S |
**1.00 |
– |
– |
≈1000 |
Excelente |
– |
W |
W |
W |
“Q, Al2O3” |
“RF, RF-R” |
“Las películas de W son deficientes en oxígeno; se oxidan en el aire.” |
Seleniuro de Estaño |
SnSe |
6.18 |
861 |
– |
– |
– |
– |
≈400 |
Bueno |
– |
– |
– |
– |
Q |
RF |
– |
Sulfuros de Estaño |
SnS |
5.22 |
882 |
– |
– |
– |
– |
≈450 |
– |
– |
– |
– |
– |
Q |
RF |
– |
Telururo de Estaño |
SnTe |
6.48 |
780 |
D |
– |
– |
– |
≈450 |
– |
– |
– |
– |
– |
Q |
RF |
– |
Titanio |
Ti |
4.5 |
1660 |
– |
0.628 |
1067 |
1235 |
1453 |
Excelente |
Fabmate® |
W |
– |
– |
TiC |
DC |
“Aleaciones con W/Ta/Mo; evoluciona gas al primer calentamiento.” |
Óxido de Titanio (II) |
TiO |
4.93 |
1750 |
– |
**1.00 |
– |
– |
≈1500 |
Bueno |
“Fabmate®, Tantalio” |
“W, Mo” |
– |
– |
VitC |
RF |
“Precalentar suavemente para eliminar gases.” |
Óxido de Titanio (III) |
Ti2O3 |
4.6 |
2130 |
D |
– |
– |
– |
– |
Bueno |
“Fabmate®, Tantalio” |
W |
– |
– |
– |
RF |
Se descompone. |
Óxido de Titanio (IV) |
TiO2 |
4.26 |
1830 |
– |
0.4 |
– |
– |
≈1300 |
Regular |
“Fabmate®, Tantalio” |
“W, Mo” |
– |
W |
– |
“Subóxido, debe ser reoxidado a rutilo. Ta reduce TiO2 a TiO y Ti.” |
Boruro de Titanio |
TiB2 |
4.5 |
2900 |
– |
**1.00 |
– |
– |
– |
Pobre |
– |
– |
– |
– |
– |
RF |
– |
Carburo de Titanio |
TiC |
4.93 |
3140 |
– |
**1.00 |
– |
– |
≈2300 |
– |
– |
– |
– |
– |
– |
RF |
– |
Nítrido de Titanio |
TiN |
5.22 |
2930 |
– |
**1.00 |
– |
– |
– |
Bueno |
Molibdeno |
Mo |
– |
– |
– |
“RF, RF-R” |
“Se prefiere la pulverización. Se descompone con evaporación térmica.” |
Wolframio |
W |
19.35 |
3410 |
– |
0.163 |
2117 |
2407 |
2757 |
Bueno |
“Directo en el Horno” |
– |
– |
– |
– |
DC |
“Forma óxidos volátiles. Las películas son duras y adherentes.” |
Boruro de Wolframio |
WB2 |
10.77 |
≈2900 |
– |
– |
– |
– |
– |
Pobre |
– |
– |
– |
– |
– |
RF |
– |
Carburo de Wolframio |
WC |
17.15 |
2860 |
– |
0.151 |
1480 |
1720 |
2120 |
Excelente |
“Grafito, Fabmate®” |
C |
– |
– |
– |
RF |
– |
Disulfuro de tungsteno |
WS2 |
7.5 |
1250 |
D |
**1.00 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Óxido de tungsteno |
WO3 |
7.16 |
1473 |
S |
**1.00 |
– |
– |
980 |
Bueno |
Tungsteno |
W |
– |
– |
– |
RF-R |
“Precalentar suavemente para eliminar gases. W reduce ligeramente el óxido.” |
Seleniuro de tungsteno |
WSe2 |
9 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Silicuro de tungsteno |
WSi2 |
9.4 |
>900 |
– |
**1.00 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Telururo de tungsteno |
WTe2 |
9.49 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Q |
RF |
– |
U |
Uranio |
U |
19.05 |
1132 |
– |
– |
1132 |
1327 |
1582 |
Bueno |
– |
“Mo, W” |
W |
W |
– |
– |
Las películas se oxidan. |
Sulfuros de Uranio (II) |
US |
10.87 |
>2000 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
Óxido de Uranio (III) |
U2O3 |
8.3 |
8.3 1300 |
D |
– |
– |
– |
– |
– |
– |
W |
– |
W |
– |
RF-R |
“Disproporciona a 1,300°C a UO2.” |
Óxido de Uranio (IV) |
UO2 |
10.96 |
2878 |
– |
– |
– |
– |
– |
– |
– |
W |
– |
W |
– |
RF |
“Ta causa descomposición.” |
Disulfuro de Uranio (IV) |
US2 |
7.96 |
>1100 |
– |
– |
– |
– |
– |
– |
– |
W |
– |
– |
– |
RF |
“Descomposición leve.” |
Carburo de Uranio |
UC2 |
11.28 |
2350 |
– |
– |
– |
– |
2100 |
– |
– |
– |
– |
– |
C |
RF |
Se descompone. |
Fluoruro de Uranio |
UF4 |
6.7 |
960 |
– |
– |
– |
– |
300 |
– |
– |
Ni |
– |
– |
– |
RF |
– |
Fosfuro de Uranio |
UP2 |
8.57 |
– |
– |
– |
– |
– |
1200 |
– |
– |
Ta |
– |
– |
– |
RF |
Se descompone. |
V |
Vanadio |
V |
5.96 |
1890 |
– |
0.53 |
1162 |
1332 |
1547 |
Excelente |
Wolframio |
“W, Mo” |
– |
– |
– |
DC |
“Mo se moja. Se prefieren películas evaporadas por haz de electrones.” |
Óxido de Vanadio (IV) |
VO2 |
4.34 |
1967 |
S |
– |
– |
– |
≈575 |
– |
– |
– |
– |
– |
– |
“RF, RF-R” |
“Se prefiere el pulverizado.” |
Óxido de Vanadio (V) |
V2O5 |
3.36 |
690 |
D |
**1.00 |
– |
– |
≈500 |
– |
– |
– |
– |
– |
Q |
RF |
– |
Carburo de Vanadio |
VB2 |
5.1 |
2400 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Carburo de Vanadio |
VC |
5.77 |
2810 |
– |
**1.00 |
– |
– |
≈1800 |
– |
– |
– |
– |
– |
RF |
– |
Nitrato de Vanadio |
VN |
6.13 |
2320 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
“RF, RF-R” |
– |
Silicidio de Vanadio |
VSi2 |
4.42 |
1700 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Y |
Iterbio |
Yb |
6.96 |
819 |
S |
1.13 |
520 |
590 |
690 |
Bueno |
Tantalio |
Ta |
– |
– |
– |
– |
Fluoruro de Iterbio |
YbF3 |
– |
1157 |
– |
– |
– |
– |
≈800 |
– |
“Tantalio, Molibdeno” |
Mo |
– |
– |
– |
RF |
– |
Óxido de Iterbio |
Yb2O3 |
9.17 |
2346 |
S |
**1.00 |
– |
– |
≈1500 |
– |
– |
– |
– |
– |
– |
“RF, RF-R” |
Pierde oxígeno. |
Itrio |
Y |
4.47 |
1522 |
– |
0.835 |
830 |
973 |
1157 |
Excelente |
Wolframio |
“W, Ta” |
W |
W |
Al2O3 |
“RF, DC” |
“Alta solubilidad de Ta.” |
Óxido de Aluminio de Itrio |
Y3Al5O12 |
– |
1990 |
– |
– |
– |
– |
– |
Bueno |
– |
– |
W |
W |
– |
RF |
“Las películas no son ferroeléctricas.” |
Fluoruro de Itrio |
YF3 |
4.01 |
1387 |
– |
– |
– |
– |
– |
– |
“Tantalio, Molibdeno” |
– |
– |
– |
– |
RF |
– |
Óxido de Itrio |
Y2O3 |
5.01 |
2410 |
– |
**1.00 |
– |
– |
≈2000 |
Bueno |
“Fabmate®, Grafito, Wolframio” |
W |
– |
– |
C |
“RF, RF-R” |
“Pierde oxígeno; las películas son lisas y claras.” |
Z |
Zinc |
Zn |
7.14 |
420 |
– |
0.514 |
127 |
177 |
250 |
Excelente |
“Fabmate®, Grafito, Wolframio” |
“Mo, W, Ta” |
W |
W |
“Al2O3, Q” |
DC |
“Evapora bien en un amplio rango de condiciones.” |
Antimonuro de Zinc |
Zn3Sb2 |
6.33 |
570 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Bromuro de Zinc |
ZnBr2 |
4.2 |
394 |
– |
– |
– |
– |
≈300 |
– |
– |
W |
– |
– |
C |
RF |
Se descompone. |
Fluoruro de Zinc |
ZnF2 |
4.95 |
872 |
– |
– |
– |
– |
≈800 |
– |
– |
Ta |
– |
– |
Q |
RF |
– |
Nitruro de Zinc |
Zn3N2 |
6.22 |
– |
– |
– |
– |
– |
– |
– |
Mo |
– |
– |
– |
RF |
Se descompone. |
Óxido de Zinc |
ZnO |
5.61 |
1975 |
– |
0.556 |
– |
– |
≈1800 |
Justo |
– |
– |
– |
– |
– |
RF-R |
– |
Seleniuro de Zinc |
ZnSe |
5.42 |
>1100 |
– |
0.722 |
– |
– |
660 |
– |
“Tantalio, Molibdeno” |
“Ta, W, Mo” |
“W, Mo” |
“W, Mo” |
Q |
RF |
“Precalentar suavemente para eliminar gases. Evapora bien.” |
Sulfuro de Zinc |
ZnS |
3.98 |
1700 |
S |
0.775 |
– |
– |
≈800 |
Bueno |
“Tantalio, Molibdeno” |
“Ta, Mo” |
– |
– |
– |
RF |
“Precalentar suavemente para eliminar gases. Las películas se descomponen parcialmente. n=2.356.” |
Telururo de Zinc |
ZnTe |
6.34 |
1239 |
– |
0.77 |
– |
– |
~600 |
– |
– |
“Mo, Ta” |
– |
– |
– |
RF |
“Precalentar suavemente para eliminar gases.” |
Zirconio |
Zr |
6.49 |
1852 |
– |
0.6 |
1477 |
1702 |
1987 |
Excelente |
– |
W |
– |
– |
– |
DC |
“Aleaciones con W. Las películas se oxidan fácilmente.” |
Boruro de Zirconio |
ZrB2 |
6.09 |
≈3200 |
– |
– |
– |
– |
– |
– |
Bueno |
– |
– |
– |
– |
RF |
– |
Carburo de Zirconio |
ZrC |
6.73 |
3540 |
– |
0.264 |
– |
– |
≈2500 |
– |
– |
– |
– |
– |
– |
RF |
– |
Nitruro de Zirconio |
ZrN |
7.09 |
2980 |
– |
**1.00 |
– |
– |
– |
– |
– |
– |
– |
– |
“RF, RF-R” |
“Evaporación reactiva en 10-3Torr N2.” |
Óxido de Zirconio |
ZrO2 |
5.89 |
≈2700 |
– |
**1.00 |
– |
– |
≈2200 |
Bueno |
“Grafito, Wolframio” |
W |
– |
– |
– |
“RF, RF-R” |
“Las películas son deficientes en oxígeno, claras y duras.” |
Silicato de Zirconio |
ZrSiO4 |
4.56 |
2550 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |
Silicuro de Zirconio |
ZrSi2 |
4.88 |
1700 |
– |
– |
– |
– |
– |
– |
– |
– |
– |
– |
RF |
– |