Chemical Vapor Deposition Equipment

PhotonExport has strong relationships with major international manufacturers to bring you High Quality Chemical Vapor Deposition Equipment (CVD) for your unique needs.

Whether you’re conducting desktop research or overseeing large-scale production, PhotonExport offers a comprehensive range of CVD equipment including CVD, PECVD, LPCVD, DLI CVD, RTCVD, and ICP CVD. Let us assist you with your CVD equipment inquiries today.

PE Chemical Vapor Deposition Equipment Single Wafer tool


Plasma Enhanced Chemical Vapor Deposition(PECVD) allows thin films (coatings) to be deposited at lower temperatures when compared to the standard process of Chemical Vapor Deposition (CVD)

PECVD Single Wafer

PECVD single wafer equipment has a very strong position in the semiconductor industry due to its ability to deposit a wide variety of thin films.

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The Annealsys AS-Master is appropriate for a wide range of RTP and RTCVD operations because to its increased temperature range, vacuum performance (atmosphere to 10-6 Torr), and gas mixing capacity.


Diffusion, LPCVD and Oxidation, 1 to 4 quartz independent Tubes, Up to 50 wafers per tube.

CVD Diamond Growth

Numerous CVD techniques are used to produce diamond films, as it can be easily synthesized from gas-phase activation condition.

PECVD Furnace

A high-precision system reaching temperatures up to 1200°C, with upgrades like Plasma Assisted CVD.

Contact us today about these and other Chemical Vapor Deposition Equipment in our catalog.