Ion Beam Milling

PhotonExport a specialist in thin films, semiconductor, and nanotechnology supplies, offers Ion Beam Milling equipment in Spain and Portugal.

Features of Ion Beam Milling

Ion Beam Milling is a process consisting of directing a beam of ions onto at a substrate within a vacuum chamber.

It is based on the momentum exchange between incident ions and atoms of the target material in the collision. This system provides a high vacuum process consisting of a broad beam ion source that irradiates the full substrate area as the substrate rotates.

The incident angle of the beam can be adjusted by a substrate stage tilt. There is substrate cooling during the etch process and uses a vertical substrate surface to avoid contamination. 

Ion Beam Milling Equipment

Fill out our form to get a personalized price quote and unleash the potential of Ion Beam Milling for your projects