Thin Film Processing Equipment
Physical Vapor Deposition, Plasma Enhanced Chemical Vapor Deposition, Dry Etching, RIE and other Thin Film Equipment.
PhotonExport can supply Physical Vapor Deposition, Plasma Enhanced Chemical Vapor Deposition, Dry Etching, Rie, and other high-quality thin film coating equipment. We have established strong relationships with major international manufacturers to bring you the best equipment and products for your unique needs.
At PhotonExport we are dedicated to enabling cutting-edge R&D, thin films, semiconductor and nanotechnology innovation by providing high-quality specialty materials and equipment that are tailored to your specifications and delivered on time and at the lowest possible cost.
High Quality Coating PVD Equipment
Our comprehensive equipment portfolio comprises a wide range of wafer processing tools, oxidation systems, lithography equipment, etching and cleaning solutions, wet CVD and PVD tools, as well as thermal processing options.
These offerings are tailored to accommodate varying scales of operation, ranging from desktop and R&D setups to small, medium, and large-scale production. Additionally, our collection features an array of accessories designed for dicing, measurements, gas abatement, and handling.
Contact us for more information and let us help you find the perfect equipment for your business.
Get Your Quote Now!
View our: Physical Vapor Deposition, Plasma Enhanced Chemical Vapor Deposition, Dry Etching, RIE and other Thin Film Equipment, and ask for your quote today!
Rapid Thermal Processing and RTA
RTP/RTA systems offering advanced features and capabilities for various applications.
PVD Magnetron Sputtering
PVD Magnetron Sputtering, a versatile system with options for R&D and production.
Single Chamber ALD/PVD
Unique systems that combine ALD and PVD technologies in a single compact setup.
RIE ICP Etching
Flexibility in substrate handling/loading, effortlessly transfer between 2in, 4in, 6in, and 8inch wafers.
PECVD Single Wafer
PECVD single wafer equipment has a very strong position in the semiconductor industry due to its ability to deposit a wide variety of thin films.
PECVD Small
Horizontal Furnace
A high-precision system reaching temperatures up to 1200°C, with upgrades like Plasma Assisted CVD.
Wafer Polishing Equipment
Chemical Mechanical Polishing (CMP) machines are designed to precisely and uniformly polish the surface of silicon wafers,
Cluster PVD – Load Lock Robot Loading
A state-of-the-art cluster tool designed for vacuum evaporation of functional films on various substrates.
Ion Beam Milling
Ion Beam Milling is a high vacuum process utilizing a direct beam of ions to impact the substrate’s surface.
Large Area RIE Systems
Reactive Ion Etching (RIE) Equipment for large area CGH manufacturing, mask etching, and Nano-Crystalline Diamond PEVD.
Large Batches PECVD
Plasma Enhanced Chemical Vapor Deposition Furnaces compact, batch-type, and single or multichambered, offering high-precision semiconductor processing.
ALD Atomic Layer Deposition
Atomic Layer Deposition (ALD) Equipment, offering unparalleled precision and high-quality thin film coatings.
CVD Diamond Growth
Diamond CVD Growth equipment – a state-of-the-art system utilizes various CVD techniques to produce diamond films with high growth rates.
Glovebox Equipment
Glovebox – enabling the handling of air and moisture-sensitive items and facilitating work with air-sensitive, toxic, or radioactive compounds in a controlled atmosphere.
Batch Spray Systems
Equipment offering compact design, high uptime, and a low cost of ownership without sacrificing quality.
Physical Vapor Deposition (PVD) Equipment Suppliers
PhotonExport supplies PVD coating equipment for various industries and equipment for Thin films processes. Our internationally recognized partners are from the United States, Germany, France, Finland, Holland and Korea.
With our Physical Vapor Deposition (PVD) Equipment suppliers we are able to offer competitive prices, focusing our market for Portugal and Spain. Contact us today to see how PhotonExport can help you with your Physical Vapor Deposition, Plasma Enhanced Chemical Vapor Deposition, Dry Etching, Rie and other Equipment needs and PVD products.
What is Physical vapor deposition (PVD)?
Physical vapor deposition (PVD) is the production of thin films or ‘coatings’ using a variety of methods involving vacuum deposits. First, a solid material is made into a vapor through a number of processes such as heating or sputtering. Next, the vaporized substance is deposited on a receiving object as a coating of a thickness ranging from a few atoms (< 10 Å or 0,0001 µm) to 100 µm (the width of a human hair).
What is Physical Vapor Deposition (PVD) Equipment?
Physical vapour deposition PVD equipment are machines that work with various technologies such as PVD, ALD, PECVD, RIE, LPCVD, Glovebox, Spin Coater, to process thin films and also to modify them, make thermal treatments, development of layers among others to meet customer needs.