PhotonExport provide’s an high-quality lineup of Silicon Nitride Wafers, engineered for the sophisticated demands of researchers and various scales of production. Our wafers, renowned for their high creep, oxidation, and temperature resistance, are pivotal in pushing the boundaries of innovation in various high-tech industries.
Exceptional Features of Silicon Nitride (Si3N4) Wafers
Advanced Deposition Techniques for Silicon Nitride Coatings
LPCVD (Low Pressure Chemical Vapor Deposition):
- Coatings are distinguished by their low thermal conductivity, cleanliness and repeatability of deposition.
- Ideal for precision-required applications, offering uniformity and stability.
PECVD (Plasma-Enhanced Chemical Vapor Deposition):
- Coatings are deposited quicker, resulting in thicker layers compared to the LPCVD method.
- Offers versatility for various application requirements, with enhanced deposition rates.
Available Wafer Sizes Tailored to Your Needs: 2” to 12” Diameters
Diverse Diameter Range for Various Applications: Our Silicon Nitride Wafers come in a range of diameters to cater to diverse project scales and requirements:
- 2 inch (50.8 mm)
- 3 inch (76.2 mm)
- 4 inch (101.6 mm)
- 6 inch (152.4 mm)
- 8 inch (203.2 mm)
- 12 inch (304.8 mm)
- Contact us for custom wafer sizes
This versatility ensures that whether your work is in microfabrication, semiconductors, or research and development, we have the wafer size to support your endeavors.
Personalized Assistance
Our team is ready to provide personalized assistance to answer any questions you may have. With our extensive range of wafer options, PhotonExport is your go-to source for silicon nitride wafers.