We offer a wide range of materials and targets specially developed based on the stringent requirements of advanced applications in areas such as High K Dielectric, Microelectromechanical systems (MEMS), Optoelectronics and Integrated Circuit (IC) Interconnects.
Our materials and targets can be used in most thin film vacuum deposition systems (OEM) thanks to our extensive offering of diverse sizes and shapes.
| Materials | Formula | Purities |
| Aluminium Oxide | Al2O3 | 99% to 99.999% |
| Cerium Oxide | CeO2 | 99.9% |
| Chrome | Cr | 99% to 99.999% |
| Copper | Cu | 99.99% to 99.999% |
| Copper Aluminium Silicium | Cu Al Si | 99.9% |
| Gold | Au | 99.95% to 99.999% |
| Hafnium | Hf | 99.9% to 99.99% (Zr<0.25%) |
| Hafnium Aluminium Oxide | Hf Al2O3 | 99.9% |
| Hafnium Oxide | HfO2 | 99.95% (Zr<0.25%) |
| Magnesium Fluoride / Chrome | MgF2 Cr | 99 % to 99.95% |
| Magnesium Oxide | MgO | 99.9% |
| Nickel | Ni | 99.6% to 99.995% |
| Niobium | Nb | 99.95% |
| Niobium Oxide | NbO2 | 99.95 % to 99.995% |
| Praseodymium Oxide | PrO2 | 99.9% |
| Silver | Ag | 99.9% to 99.99% |
| Tantalum | Ta | 0.99995 |
| Titanium | Ti | 99.8 % to 99.995% |
| Tungsten Titanium (90:10) | W | 99.9% to 99.99% |
| YAG (Yttrium Aluminium Garnet Y3Al5O12) | Y3Al5O12 | 99.9% |
| Zirconium Oxide | ZrO2 | 99.95% to 99.995% |