PhotonExport a specialist in thin films, semiconductor, and nanotechnology supplies, offers Ion Beam Milling equipment in Spain and Portugal.
What is Ion Beam Milling?
Ion Beam Milling is a process consisting of directing a beam of ions onto at a substrate within a vacuum chamber.
It is based on the momentum exchange between incident ions and atoms of the target material in the collision. This system provides a high vacuum process consisting of a broad beam ion source that irradiates the full substrate area as the substrate rotates.
The incident angle of the beam can be adjusted by a substrate stage tilt. There is substrate cooling during the etch process and uses a vertical substrate surface to avoid contamination.
Features & Benefits
- Etching angle adjustment with tiltable, rotatable substrate holder
- Excellent uniformity without shaper
- Enhanced selectivity and rate with reactive gases
- Process control with exact SIMS based
- or optical end point detection
- Carrier concept for adaptation to variable substrate sizes
- …and more contact us today for more information.
Applications
- Structuring of magnetic memory (MRAM) and
- sensors (GMR, TMR)
- Milling of metals in MEMS production (Au, Ru, Ta, …)
- Milling of multilayers from diversified metal and
- dielectric materials
- RIBE or CAIBE of compound semiconductors
- (GaAs, GaN, InP, …)
- …and more contact us today for more information